(Chloromethyl)triethoxysilane (CAS 15267-95-5) is a bifunctional organosilane compound containing both a reactive chloromethyl group and three hydrolyzable ethoxy groups, making it a versatile intermediate for synthesizing various functional silane derivatives.

In semiconductor and electronics applications, it is primarily used to form self-assembled monolayers (SAMs) on electrode surfaces (such as ITO) to modify work function and reduce charge injection barriers, and serves as a precursor for synthesizing low-dielectric-constant (low-k) insulating materials and specialty coupling agents for surface modification and encapsulation.

This silane enables significant performance improvements in organic electronic devices—including up to a 2.6-fold increase in current efficiency and a 25% reduction in hole injection barrier in OLEDs—while also providing low-k dielectric films (as low as 2.78) with good mechanical strength for advanced chip manufacturing, and enhancing adhesion, hydrophobicity, and moisture resistance in electronic packaging applications.